Precision Etching Techniques for Nickel Logo Markings

Writer：admin Time：2025-04-02 17:44 Browse：℃

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The precision etching of nickel logo markings requires overcoming conventional process limitations. To reproduce micron-level text and intricate patterns, a specialized process control system must be established. This technology is irreplaceable in applications such as anti-counterfeiting markings for luxury brands and nameplates for micro-devices.

Ultra-thin nickel substrate processing poses the primary technical challenge. For 0.05mm-thick nickel strips, vacuum adsorption conveying systems are employed to prevent surface scratches from mechanical contact. Pretreatment integrates electrochemical polishing and plasma cleaning, reducing surface roughness to below Ra 0.02μm. An online defect detection system is developed for coil materials, automatically rejecting substrates with micro-cracks during continuous production.

Micron-level pattern transfer relies on advanced plate-making technology. Laser direct writing machines engrave original designs on chromium plates, achieving minimum line widths of 5μm. Digital lithography equipment directly images patterns on workpieces, eliminating distortions caused by traditional films. Grayscale exposure technology enables gradual etching depth variations by modulating UV light intensity, particularly suitable for embossed logo production.

Precision etching fluid formulas determine detail fidelity. A sulfamic acid-based system provides selective etching characteristics, maintaining sidewall verticality within 88±2 degrees. Pulsed spray systems control etching directionality through pressure waveform adjustments, effectively reducing undercutting. Online spectrometers monitor solution components in real time, automatically replenishing consumed materials to maintain etching consistency.

3D structure fabrication requires specialized process combinations. For multi-layer logos, multi-step mask alignment technology achieves 0.01mm-precision tiered structures through five or more exposure cycles. Electroforming and chemical etching synergistically create micro-protrusions for anti-counterfeiting features. Laser-assisted etching generates localized micro-melting effects, producing unique matte-gloss contrasts.